Aichi, Japan

Haruo Fujimura

This inventor holds 1 USPTO granted patent. Top assignee: Aisin Seiki Kabushiki Kaisha. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haruo Fujimura. Retrieved from https://idiyas.com/inventor/haruo-fujimura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Haruo Fujimura: Innovator in Flow Rate Control Technology

Introduction

Haruo Fujimura is a notable inventor based in Aichi, Japan. He has made significant contributions to the field of engineering, particularly in the development of flow rate control devices for pumps. His innovative approach has led to the creation of a patented technology that enhances the efficiency and functionality of pump systems.

Latest Patents

Fujimura holds a patent for a flow rate control device for a pump. This device includes a housing, a choke tubular passageway connected between a pump pressure chamber and an output chamber, and a spool valve that is slidably provided in the housing. The spool valve is designed to allow a pressure medium to flow from the pump pressure chamber into a by-pass port as it slides in an axial direction. The choke tubular passageway is formed in a central shaft member arranged in the housing, with a sleeve member provided around the central shaft member. This sleeve member can be moved from the pump pressure chamber towards the pressure reducing chamber, thereby changing the opening area of the choke tubular passageway.

Career Highlights

Fujimura is associated with Aisin Seiki Kabushiki Kaisha, a prominent company in the automotive and manufacturing sectors. His work has been instrumental in advancing technologies that improve pump performance and reliability.

Collaborations

Throughout his career, Fujimura has collaborated with talented individuals such as Kazuhiro Maki and Shunichi Higuchi. These partnerships have fostered innovation and contributed to the successful development of new technologies.

Conclusion

Haruo Fujimura's contributions to flow rate control technology exemplify the impact of innovative thinking in engineering. His patented device represents a significant advancement in pump technology, showcasing his dedication to improving industrial applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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