Odawara, Japan

Harunobu Saitoo

This inventor holds 1 USPTO granted patent. Top assignee: Computer Basic Technology Association. Active years: 1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Harunobu Saitoo. Retrieved from https://idiyas.com/inventor/harunobu-saitoo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: Harunobu Saitoo: Innovator in Magnetic Head Technology

Introduction

Harunobu Saitoo is a notable inventor based in Odawara, Japan. He has made significant contributions to the field of magnetic head technology, particularly through his innovative production methods.

Latest Patents

Saitoo holds a patent for a production method of thin film magnetic heads. This method involves forming a magnetic film on an insulating member that covers coil conductor films after the surface of the insulating member has been flattened. The process includes creating a flattening coating on the insulating member, followed by etching both the flattening coating and the insulating member using a plasma-assisted etching technique to achieve a smooth surface.

Career Highlights

Harunobu Saitoo is associated with the Computer Basic Technology Association, where he applies his expertise in developing advanced technologies. His work has been instrumental in enhancing the efficiency and performance of magnetic heads used in various applications.

Collaborations

Saitoo has collaborated with notable colleagues, including Masanobu Hanazono and Shinichi Hara. Their combined efforts have contributed to advancements in the field of magnetic technology.

Conclusion

Harunobu Saitoo's innovative approach to the production of thin film magnetic heads showcases his dedication to advancing technology. His contributions continue to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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