Itami, Japan

Haruko Tanaka


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2011

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Haruko Tanaka: Innovator in Group III Nitride Crystal Growth

Introduction

Haruko Tanaka is a prominent inventor based in Itami, Japan. She has made significant contributions to the field of materials science, particularly in the growth of group III nitride crystals. Her innovative methods have paved the way for advancements in various applications, including optoelectronics and semiconductor technology.

Latest Patents

Tanaka holds a patent for a method of growing group III nitride crystals. This patent, titled "Group III nitride crystal and method of its growth," enables the bulk growth of these crystals using a liquid-phase technique. The method involves preparing a substrate with a group III nitride seed crystal and bringing it into contact with a nitrogen-containing gas dissolved in a group III metal-containing solvent. This innovative approach allows for the growth of high-quality group III nitride crystals.

Career Highlights

Throughout her career, Haruko Tanaka has been associated with Sumitomo Electric Industries, Limited. Her work has garnered recognition in the scientific community, and she has contributed to the advancement of crystal growth techniques. With her expertise, she has played a vital role in enhancing the performance of semiconductor materials.

Collaborations

Tanaka has collaborated with notable colleagues, including Shinsuke Fujiwara and Hiroaki Yoshida. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of materials science.

Conclusion

Haruko Tanaka's contributions to the growth of group III nitride crystals exemplify her dedication to innovation in materials science. Her patented methods have opened new avenues for research and development in semiconductor technology. Tanaka's work continues to inspire future advancements in the field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…