Company Filing History:
Years Active: 2018
Title: Haruhisa Nakano: Innovator in Graphene Film Manufacturing
Introduction
Haruhisa Nakano, an innovative inventor based in Tsuchiura, Japan, has made significant contributions to the field of semiconductor manufacturing. With a focus on graphene film technologies, he addresses critical challenges in the manufacturing process, specifically the production of wrinkle-free and residue-free graphene films.
Latest Patents
Nakano holds a patent for a "Graphene film manufacturing method and semiconductor device manufacturing method." This invention introduces a process that effectively synthesizes a high-quality graphene film without generating wrinkles or stresses, and without leaving resin residues. The method involves forming a catalyst metal film on a substrate, synthesizing the graphene film on this catalyst, and subsequently removing the metal catalyst in an oxidizing atmosphere while transferring the graphene film to the substrate.
Career Highlights
Haruhisa Nakano is associated with Fujitsu Corporation, a global leader in information technology and communications. His work is instrumental in advancing semiconductor technologies, which are crucial for various electronic devices. Through his innovative approach, he has enhanced the efficiency and quality of semiconductor materials, contributing to the broader tech industry.
Collaborations
In his professional journey, Nakano collaborates with esteemed colleagues, including Daiyu Kondo. Such collaborations foster an environment of innovation and drive the development of cutting-edge technologies within Fujitsu Corporation, enhancing the impact of their research and development efforts.
Conclusion
Haruhisa Nakano exemplifies the spirit of innovation in the field of semiconductor manufacturing. With his pioneering work on graphene film technologies, he continues to influence future advancements in electronic devices, demonstrating the vital role inventors play in shaping the future of technology.