Tokyo, Japan

Haruhiko Yamagata

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignees: Hoya Corporation, Hoyo Corporation. Active years: 2005-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haruhiko Yamagata. Retrieved from https://idiyas.com/inventor/haruhiko-yamagata

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2005-2007

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2 patents (USPTO):Explore Patents

Title: Haruhiko Yamagata: Innovator in Photomask Technology

Introduction

Haruhiko Yamagata, an esteemed inventor based in Tokyo, Japan, has made significant contributions to the field of photomask technology. With a total of two patents, his work focuses on the manufacturing processes that enhance the quality and efficiency of photomasks, which are critical in the semiconductor fabrication industry.

Latest Patents

Yamagata's latest patents include methods for obtaining photomask blanks, specifically through a process involving a sputtering target placed in a vacuum chamber. His innovative approach outlines the formation of thin films with a three-layer construction of CrN/CrC/CrON over a transparent substrate. By employing reactive sputtering in a mixed gas atmosphere containing helium, he is able to achieve a controlled helium gas flux. This technological advancement ensures that the crystal grain diameter of the CrC thin film, the thickest layer, measures between 3 to 7 nm. The result is a photomask blank characterized by low film stress and excellent film quality, alongside a high production yield, thereby revolutionizing mass production techniques in the industry.

Career Highlights

Throughout his career, Yamagata has worked with notable companies such as Hoyo Corporation and Hoya Corporation. His tenure at these organizations has been marked by a commitment to innovation and quality, contributing to advancements in photomask technology.

Collaborations

Yamagata has collaborated with distinguished professionals in the field, including Masaru Mitsui and Masao Ushida. These partnerships have facilitated the development and refinement of his patented technologies, leading to enhanced outcomes in photomask production.

Conclusion

Haruhiko Yamagata stands out as an influential inventor in the realm of photomask technology. His innovative patents not only improve manufacturing techniques but also pave the way for future advancements in semiconductor fabrication. As the industry continues to evolve, Yamagata’s contributions will undoubtedly play a vital role in shaping its trajectory.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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