Hyoto, Japan

Haruhiko Maki

This inventor holds 1 USPTO granted patent. Top assignee: Kaneka Corporation. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haruhiko Maki. Retrieved from https://idiyas.com/inventor/haruhiko-maki-1f8nlw50

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Haruhiko Maki: Innovator in Film Production Technology

Introduction

Haruhiko Maki is a notable inventor based in Hyoto, Japan. He has made significant contributions to the field of film production technology. His innovative methods have led to advancements in the way films are produced and stretched.

Latest Patents

Maki holds a patent for a "Method for producing stretched film, method for producing film, and film." This patent describes a technique for obtaining a film that is stretched uniaxially in the transverse direction. The method prevents the film from stretching in the longitudinal direction during the transverse stretching process. The film is gripped with clips that have corrugated upper and lower teeth parts, allowing it to be shaped into a wavy form while being held securely.

Career Highlights

Haruhiko Maki is associated with Kaneka Corporation, where he has been instrumental in developing innovative film production techniques. His work has contributed to the efficiency and quality of film manufacturing processes.

Collaborations

Maki has collaborated with notable colleagues, including Kenji Ueshima and Takatsugu Nakagami. Their combined expertise has further enhanced the advancements in film technology.

Conclusion

Haruhiko Maki's contributions to film production technology exemplify the impact of innovation in manufacturing processes. His patented methods continue to influence the industry and improve production efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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