Location History:
- Hyderabad, IN (2017)
- Telangana, IN (2017 - 2020)
- San Diego, CA (US) (2022)
Company Filing History:
Years Active: 2017-2022
Title: Harshit Tiwari: Innovator in Thermal Mitigation Technologies
Introduction
Harshit Tiwari is a notable inventor based in Telangana, India. He has made significant contributions to the field of thermal mitigation in devices with multiple processing units. With a total of 4 patents to his name, Tiwari is recognized for his innovative approaches to enhancing device performance and efficiency.
Latest Patents
One of Harshit Tiwari's latest patents focuses on thermal mitigation in devices that utilize both real-time and non-real-time processing units. This method involves connecting these processing units to a primary power supply and implementing a strategy for thermal management. The process includes disconnecting all but one of the non-real-time processing units from the power supply, allowing for an active non-real-time processing unit to function. A secondary power supply, which derives power from the first, is then connected to this active unit, ensuring that the voltage supplied is lower than that of the primary supply. This innovative approach aims to optimize thermal performance and enhance the overall efficiency of devices.
Career Highlights
Harshit Tiwari is currently employed at Qualcomm Incorporated, a leading company in the technology sector. His work at Qualcomm has allowed him to explore and develop advanced technologies that address critical challenges in device performance. Tiwari's expertise in thermal management has positioned him as a valuable asset within the company.
Collaborations
Throughout his career, Harshit has collaborated with talented individuals such as Maheshwar Thakur Singh and Ashish Bajaj. These collaborations have fostered an environment of innovation and creativity, contributing to the development of cutting-edge technologies.
Conclusion
Harshit Tiwari's contributions to thermal mitigation technologies exemplify his commitment to innovation and excellence. His work continues to influence the field, making significant strides in enhancing device performance and efficiency.