Harshal T Vasa

Title: Harshal T Vasa: Innovator in Physical Vapor Deposition Technology

Introduction

Harshal T Vasa is a notable inventor based in Santa Clara, CA, specializing in advanced physical vapor deposition (PVD) technologies. With a total of 2 patents to his name, he has made significant contributions to the field of material deposition processes.

Latest Patents

Harshal's latest patents include innovative methods for physical vapor deposition using backside gas cooling of workpieces. His first patent describes a circular PVD chamber equipped with multiple sputtering targets mounted on the top wall. The design features a pallet that rotates around its center axis and can shift in an XY direction, allowing precise positioning of workpieces beneath the targets. This method ensures that all areas of a workpiece can be effectively treated, minimizing material waste. The second patent further elaborates on this technology, emphasizing the creation of a cooling backside gas volume between the pallet and the sticky tape supporting the workpieces, enhancing the efficiency of the deposition process.

Career Highlights

Harshal T Vasa is currently employed at Tango Systems, Inc., where he continues to develop and refine his innovative technologies. His work has positioned him as a key player in the advancement of PVD systems, contributing to the efficiency and effectiveness of material deposition techniques.

Collaborations

Throughout his career, Harshal has collaborated with talented professionals, including Ravi Mullapudi and Harish Varma Penmethsa. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Harshal T Vasa's contributions to the field of physical vapor deposition are noteworthy, showcasing his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in material deposition processes, making him a valuable asset in the industry.