Suwon, South Korea

Harsh Agarwal

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Harsh Agarwal. Retrieved from https://idiyas.com/inventor/harsh-agarwal-r5ii3ylo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Harsh Agarwal: Inventor of Clothing Management Technology

Introduction

Harsh Agarwal is an inventor based in Suwon, South Korea, and is associated with Samsung Electronics Ltd. His work includes an invention designed to help electronic devices interpret clothing-care labels and present useful garment-management information.

Latest Patents

Agarwal is credited with 1 patent: “Electronic Device for Generating Clothing Management Information and Method of Controlling the Same.” The invention describes a device that captures an image of a clothing label, identifies its care symbols, and displays management information derived from the image. It also addresses symbol-recognition errors by using the standard and management types of other correctly recognized symbols to identify and correct a misrecognized symbol.

Career Highlights

The patent reflects work at the intersection of image recognition and practical consumer technology. By translating clothing-care symbols into displayed guidance, the disclosed system aims to make garment-care information easier to access through an electronic device.

Collaborations

The patent lists Seongjoo Han and Myeongjin Lee as Agarwal’s coworkers.

Conclusion

Harsh Agarwal’s patent contribution focuses on using image recognition to interpret clothing-care labels and provide accessible garment-management information.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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