Pleasanton, CA, United States of America

Harry K Springer

USPTO Granted Patents = 1 

Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Harry K. Springer

Introduction

Harry K. Springer is a notable inventor based in Pleasanton, CA (US). He has made significant contributions to the field of space debris modeling. His work focuses on understanding and simulating the long-term evolution of space debris, which is crucial for maintaining the safety of space operations.

Latest Patents

Harry K. Springer holds a patent for a system that models the evolution of space debris. This innovative modeling system simulates the interaction of space objects over time. It includes a propagator that calculates the position of each object based on orbital parameters. Additionally, the system features a collision detector that performs collision analysis for pairs of objects at each simulation time. When the distance between objects meets a conjunction criterion, the system calculates a local minimum distance to identify the time of closest approach. If this distance satisfies a collision criterion, the system models the debris created by the collision.

Career Highlights

Harry K. Springer is associated with Lawrence Livermore National Security, LLC, where he applies his expertise in space debris modeling. His work is vital for advancing our understanding of space environments and ensuring the safety of satellites and other space missions.

Collaborations

Throughout his career, Harry has collaborated with esteemed colleagues such as Sergei Nikolaev and Willem H. De Vries. These collaborations have further enriched his research and contributions to the field.

Conclusion

Harry K. Springer is a pioneering inventor whose work on space debris modeling is essential for the future of space exploration and safety. His innovative approaches and collaborations continue to influence the field significantly.

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