Heerhugowaard, Netherlands

Harry Alkemade

This inventor holds 1 USPTO granted patent and 2 published patent applications, plus 1 CIPO patent and 3 EPO patents. Top assignee: Lm Wind Power A/s. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Harry Alkemade. Retrieved from https://idiyas.com/inventor/harry-alkemade

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Harry Alkemade - Innovator in Wind Turbine Technology

Introduction

Harry Alkemade is an inventor based in DH Heerhugowaard, Netherlands. He is currently associated with LM Wind Power A/S, a company known for its contributions to wind turbine technology. Although he does not hold any granted patents, his work in the field of renewable energy is noteworthy.

Latest Patent Applications

Harry Alkemade has submitted a patent application for the manufacturing of a wind turbine blade spar cap. The present invention relates to a method of manufacturing a fibre-reinforced spar cap for a wind turbine blade. A plurality of pultruded fibre plates is arranged in a spar cap mould to form a stacked arrangement of pultruded fibre plates. An insert member is arranged next to a lateral surface of the stacked arrangement, wherein the first insert member comprises a connecting surface. The first insert member is arranged such that its connecting surface abuts against the first lateral surface of the stacked arrangement. Resin is infused into the stacked arrangement and the insert member to form the fibre-reinforced spar cap or a preform thereof, which can be trimmed to the required size.

Conclusion

Harry Alkemade's innovative approach to wind turbine technology highlights his commitment to advancing renewable energy solutions. His contributions, although not yet reflected in granted patents, demonstrate the potential for future developments in this vital field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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