Woodbury, MN, United States of America

Harold Todd Freemyer

USPTO Granted Patents = 6 

Average Co-Inventor Count = 5.9

ph-index = 4

Forward Citations = 222(Granted Patents)


Company Filing History:


Years Active: 2007-2015

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6 patents (USPTO):

Title: Harold Todd Freemyer: Innovator in Microporous PVDF Films

Introduction

Harold Todd Freemyer is a notable inventor based in Woodbury, MN (US). He has made significant contributions to the field of materials science, particularly in the development of microporous films. With a total of 6 patents to his name, Freemyer has established himself as a key figure in innovation.

Latest Patents

Freemyer's latest patents focus on the production of shaped microporous articles from polyvinylidene fluoride (PVDF) and nucleating agents through thermally induced phase separation (TIPS) processes. These microporous articles are oriented in at least one direction at a stretch ratio of approximately 1.1 to 1.0. The articles may also include a diluent, glyceryl triacetate, and can have micropores filled with an ion-conducting electrolyte, allowing them to function as ion-conductive membranes. The method for creating these microporous articles involves several steps, including melt blending PVDF, nucleating agents, and glyceryl triacetate, followed by cooling and stretching the shaped article.

Career Highlights

Freemyer is currently associated with 3M Innovative Properties Company, where he continues to push the boundaries of innovation in materials. His work has not only advanced the understanding of microporous materials but has also contributed to various applications in different industries.

Collaborations

Some of Freemyer's notable coworkers include Steven Joseph Hamrock and Samantha D. Smith. Their collaborative efforts have further enhanced the research and development of innovative materials.

Conclusion

Harold Todd Freemyer is a distinguished inventor whose work in microporous PVDF films has made a significant impact in the field of materials science. His contributions continue to inspire innovation and advancement in various applications.

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