Rowley, MA, United States of America

Harold L Rothwell, Jr

This inventor holds 38 USPTO granted patents, primarily in Arc Discharge Lamps. Top assignees: Gte Products Corporation, Osram Sylvania Inc.. Active years: 1981-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Harold L Rothwell, Jr. Retrieved from https://idiyas.com/inventor/harold-l-rothwell-jr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.6

ph-index = 12

Forward Citations = 400(Granted Patents)


Location History:

  • Rowely, MA (US) (1987)
  • Rowley, MA (US) (1981 - 1988)
  • Georgetown, MA (US) (1989 - 1992)
  • Hopkinton, NH (US) (1996 - 2011)

Company Filing History:


Years Active: 1981-2011

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Areas of Expertise:
Neon Discharge Lamp
Metal Halide
High Intensity Discharge
Pulsed Operation
Ballast Design
Electrode Alignment
Arc Stability
Lamp Fabrication
Automotive Applications
Light Source
Low Wattage
Gas Fill Process
38 patents (USPTO):Explore Patents

Title: The Innovative Mind of Harold L Rothwell, Jr

Introduction: Harold L Rothwell, Jr, a distinguished inventor hailing from Rowley, MA (US), is known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Harold L Rothwell, Jr holds several patents in various technological domains, showcasing his versatility and ingenuity in inventing cutting-edge solutions.

Career Highlights: Throughout his illustrious career, Harold L Rothwell, Jr has consistently pushed the boundaries of innovation, with a keen focus on developing solutions that have a tangible impact on society.

Collaborations: Harold L Rothwell, Jr has collaborated with leading research institutions, universities, and companies to bring his inventions to life, fostering a culture of innovation and collaboration in the industry.

Conclusion: Harold L Rothwell, Jr's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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