Hannover, Germany

Harald Vennegeerts

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Hannover, DE (2019)
  • Berlin, DE (2024)

Company Filing History:


Years Active: 2019-2024

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2 patents (USPTO):Explore Patents

Title: The Innovations of Harald Vennegeerts

Introduction

Harald Vennegeerts is a notable inventor based in Hannover, Germany. He has made significant contributions to the field of metrology through his innovative patents. With a total of 2 patents, Vennegeerts has focused on enhancing image processing and detection device calibration.

Latest Patents

One of his latest patents is related to dark image enhancement. This invention outlines a method for improving images used in metrological applications. The process involves providing a geometric correction image that has a higher geometric correctness than the processed image. It also includes steps to reduce the loss of initial metrological information by fusing the enhanced image with the geometric correction image. Another significant patent is for a method and device designed for the three-dimensional geometrical detection of an environment. This device incorporates an inertial measurement system to provisionally calculate its trajectory. The calibration process involves positioning the device relative to a reference point and determining error variables to correct the provisional trajectory.

Career Highlights

Harald Vennegeerts is currently employed at Leica Geosystems AG, where he continues to develop innovative solutions in the field of metrology. His work has been instrumental in advancing technologies that enhance measurement accuracy and efficiency.

Collaborations

Throughout his career, Vennegeerts has collaborated with notable colleagues, including Christian Hesse and Erwin A Frei. These partnerships have contributed to the successful development of his patents and innovations.

Conclusion

Harald Vennegeerts is a distinguished inventor whose work in dark image enhancement and detection device calibration has made a significant impact in metrology. His contributions continue to shape the future of measurement technologies.

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