The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2024

Filed:

Jul. 19, 2021
Applicant:

Leica Geosystems Ag, Heerbrugg, CH;

Inventors:

Bernhard Metzler, Dornbirn, AT;

Harald Vennegeerts, Berlin, DE;

Aldo Facchin, Azzano Decimo, IT;

Assignee:

LEICA GEOSYSTEMS AG, Heerbrugg, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2022.01); G06T 3/4046 (2024.01); G06T 5/00 (2006.01); G06T 5/40 (2006.01); G06T 5/50 (2006.01); G06T 7/70 (2017.01); G01S 17/89 (2020.01);
U.S. Cl.
CPC ...
G06T 5/50 (2013.01); G06T 3/4046 (2013.01); G06T 5/003 (2013.01); G06T 5/006 (2013.01); G06T 5/40 (2013.01); G06T 7/70 (2017.01); G01S 17/89 (2013.01); G06T 2207/10024 (2013.01); G06T 2207/20084 (2013.01); G06T 2207/20221 (2013.01);
Abstract

The invention relates to a method for enhancing images for metrological applications. The method comprises the steps: 1) providing a geometric correction image having an image geometric correctness higher than the processed image geometric correctness and showing at least a part of the scene of interest, and 2) at least partially reducing the loss of initial metrological information in the distorted metrological information by fusing the enhanced image with the geometric correction image.


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