Hinterzarten, Germany

Harald Mueller

This inventor holds 1 USPTO granted patent. Top assignee: Daimler-Benz Ag. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Harald Mueller. Retrieved from https://idiyas.com/inventor/harald-mueller-2mrqjj5i

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 27(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: The Innovations of Harald Mueller

Introduction

Harald Mueller is a notable inventor based in Hinterzarten, Germany. He has made significant contributions to the field of technology, particularly in the production of high-resistance silicon carbide. His work has garnered attention for its potential applications in various industries.

Latest Patents

Harald Mueller holds a patent for a "Process for producing high-resistance silicon carbide." This innovation showcases his expertise and commitment to advancing materials science. He has 1 patent to his name, reflecting his contributions to the field.

Career Highlights

Mueller is currently employed at Daimler-Benz AG, a leading automotive company known for its innovation and engineering excellence. His role at the company allows him to work on cutting-edge technologies that drive the automotive industry forward.

Collaborations

Throughout his career, Harald has collaborated with esteemed colleagues such as Ekkehard Niemann and Juergen Schneider. These partnerships have enabled him to enhance his research and development efforts, leading to impactful innovations.

Conclusion

Harald Mueller's work in producing high-resistance silicon carbide exemplifies his dedication to innovation in technology. His contributions at Daimler-Benz AG and collaborations with other professionals highlight his significant role in advancing the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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