This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Soochow University. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: Haoyu Li - Innovator in Optical Absorption Technology
Introduction
Haoyu Li is a prominent inventor based in Suzhou, China. He has made significant contributions to the field of optical technology, particularly in the development of advanced optical absorbers. His innovative work has led to the creation of a patented technology that enhances optical absorption efficiency.
Latest Patents
Haoyu Li holds a patent for an "Ultra wide band optical absorber based on multilayer transition metal layers." This invention provides an ultra wide band (UWB) optical absorber that operates within the visible-near infrared band and the mid-infrared band. The design features a high reflecting metal film layer, a transition metal film layer, and a dielectric film layer, all stacked sequentially on a substrate. The high reflecting metal film layer prevents light transmission, while the combination of the multilayer transition metal film layers and the dielectric film layer reduces reflection. This innovative structure achieves an average absorptivity of more than 92% in the visible-near infrared band of 400-2500 nm and over 80% in the mid-infrared band of 3-16 μm.
Career Highlights
Haoyu Li is affiliated with Soochow University, where he continues to advance research in optical technologies. His work has garnered attention for its practical applications and potential impact on various industries.
Collaborations
Haoyu Li collaborates with notable colleagues, including Cheng Zhang and Xiaofeng Li. Their combined expertise contributes to the advancement of research in optical absorption technologies.
Conclusion
Haoyu Li's innovative contributions to optical absorption technology demonstrate his commitment to advancing the field. His patented work not only showcases his ingenuity but also holds promise for future applications in various sectors.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile