Company Filing History:
Years Active: 2024
Title: Haotian Long: Innovator in Semiconductor Polishing Technology
Introduction
Haotian Long is a prominent inventor based in Guangdong, China. He has made significant contributions to the field of semiconductor technology, particularly in the area of polishing methods. His innovative approach has led to advancements that enhance the efficiency and effectiveness of semiconductor wafer processing.
Latest Patents
Haotian Long holds a patent for a "Magnetorheological-elastomer polishing pad for chemical mechanical polishing of semiconductor wafer, preparation method and application thereof." This invention discloses a magnetorheological-elastomer (MRE) polishing pad that is suitable for chemical mechanical polishing (CMP) of semiconductor wafers. The MRE polishing pad enables high-efficiency magnetic control polishing while simultaneously facilitating a high-efficiency Fenton reaction. It forms an organosilicon-polyurethane matrix through an organosilicon-modified polyurethane prepolymer, combining high flexibility with excellent mechanical properties. The incorporation of CIP@FeO composite magnetic particles allows the polishing pad to exhibit a high magnetorheological effect, which aids in oxidizing the surface of the semiconductor wafer to generate an oxide layer. This innovation reduces the material removal difficulty of abrasive materials and the polishing pad under mechanical action.
Career Highlights
Haotian Long is affiliated with the Guangdong University of Technology, where he continues to engage in research and development in semiconductor technologies. His work has garnered attention for its practical applications in the semiconductor industry, contributing to advancements in manufacturing processes.
Collaborations
Haotian Long has collaborated with notable colleagues, including Jiabin Lu and Da Hu. Their combined expertise has furthered research efforts in the field of semiconductor polishing technologies.
Conclusion
Haotian Long's innovative contributions to semiconductor polishing technology exemplify the impact of research and development in enhancing manufacturing processes. His patent reflects a significant advancement in the field, showcasing the potential for improved efficiency in semiconductor wafer processing.