Shanghai, China

Haotia Fan

This inventor holds 1 USPTO granted patent. Top assignee: Casco Signal Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haotia Fan. Retrieved from https://idiyas.com/inventor/haotia-fan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Haotia Fan: Innovator in Communication Technology

Introduction

Haotia Fan is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of communication technology. His innovative approach has led to the development of a unique communication method that enhances data processing security and reliability.

Latest Patents

Haotia Fan holds 1 patent for his invention titled "Communication method based on dual channels and RSSP-I, apparatus, electronic device and storage medium." This invention involves a method that includes initializing configuration data, loading independent configuration information on dual CPUs, sending messages according to the RSSP-I communication protocol, and receiving messages in the same manner. Compared to prior art, this invention guarantees improved security and reliability in data processing.

Career Highlights

Haotia Fan is currently employed at Casco Signal Ltd., where he continues to work on innovative solutions in communication technology. His expertise and dedication have positioned him as a valuable asset to his company and the industry.

Collaborations

Haotia has collaborated with notable coworkers, including Lintai Fu and Jianjin Jiang. Their combined efforts contribute to the advancement of technology within their field.

Conclusion

Haotia Fan's contributions to communication technology exemplify the impact of innovative thinking in enhancing data security and reliability. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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