Haomin Xu

Title: Haomin Xu: Innovator in Film Layer Deposition Technologies

Introduction

Haomin Xu is a prominent inventor based in Singapore, known for his contributions to the field of film layer deposition technologies. With a total of 2 patents, he has made significant advancements that enhance the efficiency and effectiveness of substrate processing.

Latest Patents

Haomin Xu's latest patents include innovative methods for depositing film layers. One notable patent describes a method for depositing a film layer on a substrate that incorporates ion flux control to alter sputtering atom trajectories. This method involves flowing argon gas around the periphery of the substrate, forming a plasma to ionize the argon gas, and generating an AC bias on the substrate to increase the Ar+ ion flux density. This process ultimately enhances the deposition of aluminum atoms on the substrate. Another patent focuses on methods and apparatus for depositing amorphous indium tin oxide film. This involves positioning a substrate opposite a sputter target, flowing a plasma-forming gas, and sputtering indium tin oxide onto the substrate while applying AC bias.

Career Highlights

Haomin Xu is currently employed at Applied Materials, Inc., where he continues to develop cutting-edge technologies in the field of materials science. His work has been instrumental in advancing the capabilities of film deposition processes, which are critical in various applications, including electronics and optics.

Collaborations

Haomin Xu has collaborated with notable colleagues, including Yaoying Zhong and Siew Kit Hoi, to further enhance the research and development efforts within his field.

Conclusion

Haomin Xu's innovative work in film layer deposition technologies has positioned him as a key figure in the industry. His patents reflect a commitment to advancing substrate processing techniques, contributing to the ongoing evolution of materials science.