Langfang, China

Haofeng Zhang

This inventor holds 1 USPTO granted patent. Top assignee: Yungu (Gu'an) Technology Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haofeng Zhang. Retrieved from https://idiyas.com/inventor/haofeng-zhang-bsmns5qv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Haofeng Zhang: Innovator in Display Technology

Introduction

Haofeng Zhang is a prominent inventor based in Langfang, China. He has made significant contributions to the field of display technology, particularly with his innovative designs that enhance user experience.

Latest Patents

Zhang holds a patent for a display panel featuring an optical fingerprint region. This display panel includes a light-blocking layer equipped with multiple through holes, along with a protection layer that contains a filling part. The filling part is designed to closely fit the side walls of the through holes, ensuring both functionality and aesthetic appeal. The protection layer also incorporates a light-transmitting part, which is crucial for the panel's performance.

Career Highlights

Zhang is currently employed at Yungu (Gu'an) Technology Co., Ltd., where he continues to push the boundaries of display technology. His work has garnered attention for its innovative approach to integrating fingerprint recognition into display panels.

Collaborations

Zhang collaborates with talented coworkers, including Qingrong Ren and Rubo Xing, who contribute to the development of cutting-edge technologies in their field.

Conclusion

Haofeng Zhang's contributions to display technology exemplify the spirit of innovation. His patent for a display panel with an optical fingerprint region showcases his commitment to advancing technology in meaningful ways.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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