Shanghai, China

Haofeng Tu

This inventor holds 4 USPTO granted patents and 2 published patent applications and 4 EPO patents. Top assignee: Pinnacle Vista, LLC. Active years: 2017-2019.

USPTO Granted Patents = 4 

% Patents Active = 100.0

 

Average Co-Inventor Count = 1.0

ph-index = 3

Forward Citations = 102(Granted Patents)


Company Filing History:


Years Active: 2017-2019

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4 patents (USPTO):Explore Patents

Title: Haofeng Tu: Innovator in Underwater Drone Technology

Introduction

Haofeng Tu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of drone technology, particularly in underwater applications. With a total of 4 patents to his name, Tu is recognized for his innovative approaches to enhancing drone capabilities.

Latest Patents

Among his latest inventions is the "Underwater Leading Drone System." This system provides methods for a leading drone to navigate to a future location based on the anticipated position of a base station. The technology allows for the formation of paths for both the base station and the leading drone, enabling the leading drone to collect sensor data and perform various tasks while moving ahead of the base station. This innovative approach enhances the efficiency and functionality of drone operations in underwater environments.

Career Highlights

Haofeng Tu has worked with notable companies such as Pinnacle Vista, LLC and Shanghai Autoflight Co., Ltd. His experience in these organizations has contributed to his expertise in developing advanced drone systems. His work has been instrumental in pushing the boundaries of what is possible in drone technology.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

Haofeng Tu's contributions to underwater drone technology exemplify his innovative spirit and dedication to advancing the field. His patents reflect a commitment to enhancing the capabilities of drones, paving the way for future developments in this exciting area of technology.

Profile summary based on public USPTO records.
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