Shenzhen, China

Haobo Wu

This inventor holds 1 USPTO granted patent. Top assignee: Shenzhen Cosbeauty Technology Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haobo Wu. Retrieved from https://idiyas.com/inventor/haobo-wu-2s8rtxgk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Haobo Wu - Innovator in Beauty Technology

Introduction

Haobo Wu is a prominent inventor based in Shenzhen, China. He has made significant contributions to the field of beauty technology, particularly with his innovative designs and patents. His work focuses on enhancing beauty treatments through advanced technology.

Latest Patents

Haobo Wu holds a patent for a radio frequency beauty instrument. This invention represents a breakthrough in non-invasive beauty treatments, utilizing radio frequency technology to improve skin appearance and texture. His patent showcases his commitment to innovation in the beauty industry.

Career Highlights

Wu is currently employed at Shenzhen Cosbeauty Technology Co., Ltd. His role at the company allows him to explore and develop new technologies that cater to the beauty market. His dedication to research and development has positioned him as a key player in the industry.

Collaborations

Haobo Wu collaborates with talented individuals such as Huifeng Zhang and Hongtao Wang. Together, they work on various projects that aim to push the boundaries of beauty technology and create effective solutions for consumers.

Conclusion

Haobo Wu's contributions to beauty technology through his patent and work at Shenzhen Cosbeauty Technology Co., Ltd. highlight his innovative spirit and dedication to improving beauty treatments. His efforts continue to inspire advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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