Hao-Yun Cheng

Title: Hao-Yun Cheng: Innovator in Semiconductor Technology

Introduction

Hao-Yun Cheng is a prominent inventor based in Keelung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His innovative methods have advanced the development of semiconductor devices, showcasing his expertise and dedication to the industry.

Latest Patents

Hao-Yun Cheng's latest patents include groundbreaking methods for forming semiconductor devices. One of his notable inventions involves a method that includes forming a fin extending from a substrate, creating a first gate mask over the fin, and a second gate mask with a greater width. This process also includes depositing filling layers and utilizing a chemical mechanical polish (CMP) process for planarization. Another patent focuses on similar techniques for semiconductor device formation, emphasizing the importance of precision in the etching processes involved.

Career Highlights

Cheng is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes. His innovative approaches have positioned him as a key player in the field.

Collaborations

Hao-Yun Cheng collaborates with talented professionals such as Shu-Wei Hsu and Yu-Jen Shen. These partnerships foster a creative environment that drives innovation and leads to the development of cutting-edge technologies.

Conclusion

Hao-Yun Cheng's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant inventor in the industry. His work continues to influence advancements in semiconductor manufacturing, making a lasting impact on the field.