Hao-Wei Kang

Title: **Hao-Wei Kang: Innovator in PVD Systems**

Introduction

Hao-Wei Kang, located in Taoyuan County, Taiwan, is a noteworthy inventor with a focus in the field of physical vapor deposition (PVD) systems. His innovative approach has led to the development of a significant patent, contributing to advancements in semiconductor manufacturing technologies.

Latest Patents

Hao-Wei Kang holds a patent for a PVD system and collimator. This invention encompasses a unique PVD system designed to enhance the efficiency of semiconductor wafer processing. The system features a pedestal that holds a semiconductor wafer, a cover plate that supports a target, and a collimator strategically placed between these two components. The collimator has multiple passages that selectively allow source material to pass through at specific angles, optimizing the deposition process and ensuring the integrity of the resulting thin films.

Career Highlights

Kang is affiliated with Taiwan Semiconductor Manufacturing Company Limited, a leading organization in the semiconductor industry. His role at the company places him at the forefront of innovation, where he applies his expertise in vacuum technology and materials science to improve manufacturing processes and product quality.

Collaborations

Throughout his career, Hao-Wei Kang has collaborated with talented colleagues, including Kuan-Lin Chen and Tsung-Yi Chou. These partnerships have likely contributed to his inventive output and reinforced TSMC’s reputation for technological leadership and innovation in the semiconductor field.

Conclusion

Hao-Wei Kang exemplifies the spirit of innovation in the semiconductor industry. His patent for a PVD system and collimator reflects the crucial advancements being made in semiconductor manufacturing. As technologies continue to evolve, Kang’s contributions will undoubtedly play a key role in shaping the future of this important sector.