Chengdu, China

Hao Ou


Average Co-Inventor Count = 12.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):

Title: Hao Ou - Innovator in High-Temperature-Resistant Copolymers

Introduction

Hao Ou, an esteemed inventor based in Chengdu, China, has made significant strides in the field of material science. With a focus on high-temperature-resistant materials, Hao has developed innovative solutions that can withstand challenging environments. His expertise and dedication have led to the filing of a noteworthy patent.

Latest Patents

Hao Ou holds a patent for "High-temperature-resistant deep penetration molecular membrane acid copolymers and preparation methods thereof." This patent encompasses a groundbreaking copolymer created by polymerizing four raw monomers: 2-acrylamido-2-methylpropanesulphonic acid, vinyl phosphonic acid, alkyl dimethylallyl ammonium chloride, and perfluoropolyether acrylate. The preparation method involves a series of meticulously detailed steps, including the mixing of components to form an oil phase, followed by the creation of an aqueous phase and their subsequent combination. The process concludes with a nitrogen introduction and a heating polymerization reaction, yielding a molecular membrane agent that offers unique properties suitable for various applications.

Career Highlights

Throughout his career, Hao Ou has collaborated with prominent organizations. He has made considerable contributions while working at Chengdu Leps Technology Co., Ltd and Southwest Petroleum University. His roles in these institutions demonstrate his commitment to advancing scientific research and innovation.

Collaborations

Hao has worked alongside other talented individuals, including Jianchun Guo and Bin Liu. These collaborations have likely played a significant role in the success of his projects, highlighting the importance of teamwork in the innovation process.

Conclusion

In summary, Hao Ou stands out as a leading inventor in the field of high-temperature-resistant materials. His dedication to research and development, as evidenced by his patent and career accomplishments, reflects his passion for innovation. As he continues to contribute to the field, the impact of his work is expected to resonate across various industries.

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