Camas, WA, United States of America

Hao Lee


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: Innovative Contributions of Inventor Hao Lee

Introduction

Hao Lee, an accomplished inventor based in Camas, WA, has made significant strides in the field of microelectronics through his innovative patent. With a focus on improving the lithographic processes fundamental to semiconductor manufacturing, Lee's contributions help advance technology in a rapidly evolving industry.

Latest Patents

Hao Lee holds a patent for "Adhesion layers for EUV lithography." This invention introduces new lithographic compositions designed specifically for use as adhesion layers in extreme ultraviolet (EUV) lithography. The patent describes methods for fabricating microelectronics structures that utilize these innovative compositions, highlighting the use of an adhesion layer directly beneath the photoresist layer. The methodology allows for the adhesion layer to be efficiently applied to the substrate or any intermediary layers, such as spin-on carbon or silicon hardmasks. Lee’s preferred adhesion layers are composed of spin-coatable, polymeric materials, which effectively enhance adhesion while minimizing pattern collapse issues during manufacturing.

Career Highlights

Hao Lee is currently employed at Brewer Science, Inc., a company recognized for its pioneering efforts in materials science and technology. His work there centers on the challenges posed by modern lithographic techniques, contributing significant knowledge and innovations to the company's portfolio. Lee's expertise in polymeric compositions is pivotal to Brewer Science's ongoing mission to advance microfabrication technologies.

Collaborations

Throughout his career, Hao Lee has collaborated with talented coworkers including Andrea M. Chacko and Vandana Krishnamurthy. These partnerships have facilitated innovative research and the development of cutting-edge solutions in microelectronics, showcasing the importance of teamwork in scientific advancements.

Conclusion

Hao Lee’s contributions to the field of EUV lithography through his patent for adhesion layers mark a significant achievement in microelectronics. As part of Brewer Science, Inc., Lee continues to influence the industry with his innovative approach to solving complex challenges. His work not only enhances manufacturing processes but also firmly establishes him as an important figure in the realm of technology innovations.

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