Lansdale, PA, United States of America

Hao Chang

This inventor holds 2 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: E.i. Dupont De Nemours and Company. Active years: 2013-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hao Chang. Retrieved from https://idiyas.com/inventor/hao-chang-1959nyou

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2013-2015

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2 patents (USPTO):Explore Patents

Title: Innovations by Inventor Hao Chang in Thermal Development Technology

Introduction

Hao Chang, an accomplished inventor based in Lansdale, Pennsylvania, has made significant contributions to the field of thermal development technology. With two patents to his name, he showcases his inventive spirit and dedication to improving printing processes. His work specializes in the creation of efficient methods and apparatuses that enhance the printing form from photosensitive elements.

Latest Patents

Chang's latest patents include "Apparatus for Thermal Development with a Conformable Support" and "Method for Thermal Development with a Conformable Support." Both inventions focus on forming a relief pattern from a photosensitive element through thermal development. The apparatus utilizes a method that thermally develops the photosensitive element by heating a composition layer to liquefy a portion of it. A conformable layer is positioned between the photosensitive element and a base support, enhancing compressibility and contact with the development medium. These patents significantly improve the efficiency of removing liquefied portions and ensure the uniformity of the relief pattern formed, showcasing Chang's innovative approach in this specialized area.

Career Highlights

Hao Chang is associated with E.I. DuPont de Nemours and Company, a leading corporation known for its advancements in materials science and innovative technologies. His experiences and contributions at DuPont have played a critical role in his patent achievements, enabling him to impact the thermal development sector significantly.

Collaborations

In his professional journey, Chang has collaborated with Mark Leaman Armstrong, working together to enhance their innovations in the field. Their partnership has yielded fruitful results, promoting progress in thermal development technologies, which benefit various printing applications.

Conclusion

Hao Chang’s innovative contributions to thermal development technology underscore the importance of continuous improvement in printing processes. His patents reflect a commitment to efficiency and quality, marking him as an influential figure in the industry. As technology evolves, Chang's work will undoubtedly have a lasting impact on the field of thermal development and printing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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