Company Filing History:
Years Active: 2005-2006
Title: Hanzhong Xiao: Innovator in Photoresist Technology
Introduction
Hanzhong Xiao is a notable inventor based in Pleasanton, CA (US). He has made significant contributions to the field of photoresist technology, holding 2 patents that showcase his innovative approaches to etching processes.
Latest Patents
One of Hanzhong Xiao's latest patents is titled "Method providing an improved bi-layer photoresist pattern." This patent describes a method for etching a feature in a layer by forming an underlayer of polymer material over the layer, followed by a top image layer. The top image layer is exposed to patterned radiation, and a pattern is developed, which is then transferred to the underlayer using a reducing dry etch. This process allows for precise etching through the underlayer, utilizing it as a pattern mask during the etching of the layer.
Another significant patent is "Methods and apparatus for the optimization of photo resist etching in a plasma processing system." This patent discloses a method aimed at minimizing differences in the etch rate of photoresist material across different regions of a substrate. The method involves introducing a substrate with an underlying layer and a photo-resist layer, flowing an etchant gas mixture into a plasma reactor, and striking a plasma from the gas mixture to etch the photo-resist layer.
Career Highlights
Hanzhong Xiao is currently employed at Lam Research Corporation, where he continues to develop innovative solutions in the field of semiconductor manufacturing. His work focuses on enhancing the efficiency and effectiveness of photoresist etching processes.
Collaborations
Hanzhong has collaborated with notable colleagues, including Helen H Zhu and Kuo-Lung Tang, contributing to advancements in their shared field of expertise.
Conclusion
Hanzhong Xiao's contributions to photoresist technology through his patents and work at Lam Research Corporation highlight his role as an influential inventor in the semiconductor industry. His innovative methods continue to shape the future of etching processes.