This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Advanced Micro-Fabrication Equipment Inc, Shanghai. Active years: 2017-2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017-2018
Title: Hanting Zhang: Innovator in Semiconductor Coating Technologies
Introduction
Hanting Zhang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the area of advanced coatings for plasma processing chambers. With a total of 2 patents, Zhang's work is recognized for its innovative approach to enhancing the performance and reliability of semiconductor equipment.
Latest Patents
One of Hanting Zhang's latest patents focuses on the development of a coating for packaged chamber parts used in semiconductor plasma apparatus. This advanced coating is designed to be applied over an anodized surface that has not been sealed. The process involves forming the coating, masking the coated area, and subsequently sealing the remaining anodized surface. The unique porous and rough structure of the anodized but unsealed aluminum significantly enhances the adhesion of the coating. To mitigate particle generation, the exposed anodized surface is sealed after the coating formation. The coating can consist of yttria, which is formed using plasma-enhanced atomic deposition techniques, resulting in a dense and smooth finish.
Career Highlights
Hanting Zhang is currently employed at Advanced Micro-Fabrication Equipment Inc. in Shanghai. His work at this company has positioned him as a key player in the semiconductor manufacturing industry. Zhang's innovative solutions have contributed to advancements in the efficiency and effectiveness of semiconductor processing technologies.
Collaborations
Zhang collaborates with talented coworkers, including Lei Wan and Zhaoyang Xu. Their combined expertise fosters a creative environment that drives innovation in their projects.
Conclusion
Hanting Zhang's contributions to semiconductor technology through his innovative coatings demonstrate his commitment to advancing the field. His work not only enhances the performance of semiconductor equipment but also sets a standard for future innovations in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile