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Years Active: 2024-2025
Title: Hanspeter Menner: Innovator in Semiconductor Manufacturing
Introduction
Hanspeter Menner is a notable inventor based in Freiburg, Germany. He has made significant contributions to the field of semiconductor manufacturing, holding 2 patents that showcase his innovative approaches.
Latest Patents
One of his latest patents is titled "Method and apparatus for manufacturing a semiconductor layer and substrate provided therewith." This patent discloses a semiconductor layer that includes at least one compound of the formula MMN. In this formula, M is selected from group 13 of the periodic table, and M is chosen from a group that includes scandium, yttrium, erbium, and europium. The parameter a is selected between 0.01 and 0.99. The method involves supplying a first precursor into a reaction chamber, where the precursor is provided at a molar flow rate of at least 1·10 mol/min. This is achieved by using a first bubbler, from which the precursor is evaporated and supplied to the reaction chamber, with the temperature of the first bubbler being more than 90° C.
Career Highlights
Hanspeter Menner has worked with prestigious institutions such as Albert-Ludwigs-Universität Freiburg and Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. His work in these organizations has allowed him to advance his research and contribute to the field of semiconductor technology.
Collaborations
Some of his notable coworkers include Stefano Leone and Christian Manz. Their collaboration has likely fostered an environment of innovation and creativity in their projects.
Conclusion
Hanspeter Menner's contributions to semiconductor manufacturing through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry and inspire future innovations.