Arbon, Switzerland

Hansjorg Rutz

This inventor holds 1 USPTO granted patent. Top assignee: Zellweger Luwa Ag. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hansjorg Rutz. Retrieved from https://idiyas.com/inventor/hansjorg-rutz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: The Innovations of Hansjorg Rutz

Introduction

Hansjorg Rutz is a notable inventor based in Arbon, Switzerland. He has made significant contributions to the field of engineering, particularly in the area of drawing units. His innovative approach has led to the development of a unique method and device that enhances the regulation of drawing units.

Latest Patents

Hansjorg Rutz holds one patent titled "Method and device for regulating the draw of a drawing unit." This invention showcases his expertise and commitment to improving industrial processes. The patent reflects his ability to address complex challenges in the engineering sector.

Career Highlights

Rutz is currently employed at Zellweger Luwa AG, a company known for its advancements in textile technology. His role at the company allows him to apply his inventive skills in a practical setting, contributing to the development of innovative solutions in the industry.

Collaborations

One of his notable coworkers is Francois Baechler. Their collaboration exemplifies the teamwork and shared vision that drive innovation within their organization.

Conclusion

Hansjorg Rutz's contributions to the field of engineering through his patent and work at Zellweger Luwa AG highlight his role as a significant inventor. His innovative spirit continues to inspire advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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