Hamburg, Germany

Hans-Werner Lütjens

This inventor holds 1 USPTO granted patent. Top assignee: Koninklijke Philips Corporation N.v.. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hans-Werner Lütjens. Retrieved from https://idiyas.com/inventor/hans-werner-landuumltjens

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2003

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovations of Hans-Werner Lütjens

Introduction

Hans-Werner Lütjens is a notable inventor based in Hamburg, Germany. He has made significant contributions to the field of technology, particularly in the area of measuring rotational velocity. His work has been recognized through the granting of a patent, showcasing his innovative spirit and technical expertise.

Latest Patents

Lütjens holds a patent for an "Arrangement for measuring rotational velocity." This invention reflects his commitment to advancing measurement technologies and improving accuracy in various applications. He has 1 patent to his name, which highlights his contributions to the field.

Career Highlights

Lütjens is currently employed at Koninklijke Philips Corporation N.V., a leading company in the technology and healthcare sectors. His role at Philips allows him to collaborate with other talented professionals and contribute to groundbreaking projects. His career is marked by a dedication to innovation and excellence.

Collaborations

Throughout his career, Lütjens has worked alongside esteemed colleagues such as Bernd Seidel and Stephan Linke. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of new technologies.

Conclusion

Hans-Werner Lütjens exemplifies the spirit of innovation through his work and contributions to technology. His patent and collaborations reflect his commitment to advancing the field and making a lasting impact.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…