Rothrist, Switzerland

Hans Ulrich Hoppler

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Omya Development Ag. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hans Ulrich Hoppler. Retrieved from https://idiyas.com/inventor/hans-ulrich-hoppler

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Hans Ulrich Hoppler

Introduction

Hans Ulrich Hoppler is a notable inventor based in Rothrist, Switzerland. He has made significant contributions to the field of materials science, particularly in the treatment of mineral fillers. His innovative methods have implications for various applications, especially in the production of breathable films.

Latest Patents

One of Hans Ulrich Hoppler's key patents is titled "Method for treating a mineral filler with a polydialkylsiloxane and a fatty acid, resulting hydrophobic fillers and uses thereof in polymers for breathable films." This invention focuses on a method for treating mineral fillers using polydialkylsiloxane and fatty acids. The resulting hydrophobic fillers can be utilized in polymers, particularly for manufacturing breathable films.

Career Highlights

Throughout his career, Hans Ulrich Hoppler has worked with prominent companies such as Omya Development AG and Omya International AG. His experience in these organizations has allowed him to refine his expertise in materials and polymers.

Collaborations

Hans has collaborated with notable professionals in his field, including Edwin Ochsner and Daniel Frey. These collaborations have contributed to the advancement of his research and innovations.

Conclusion

Hans Ulrich Hoppler's work exemplifies the intersection of innovation and practical application in materials science. His contributions continue to influence the development of advanced materials for various industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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