Company Filing History:
Years Active: 1977
Title: The Innovative Contributions of Hans Pulker
Introduction
Hans Pulker is a notable inventor based in Triesen, FL. He has made significant contributions to the field of vacuum deposition technology. With a total of 2 patents, his work focuses on the measurement and control of particle flow in vacuum environments.
Latest Patents
Hans Pulker's latest patents include an "Apparatus for determining the rate of flow of particles in a vacuum." This innovative apparatus utilizes the relationship that the rate of flow of particles is equal to the density of the particle current times the mean velocity of the particles. The device establishes a flow of particles and directs a laser beam through this current to measure the attenuation of the beam. This measurement allows for the determination of vapor density within the current. The absorption wavelength shift of the laser beam indicates the velocity component of the current, produced by the Doppler effect. The vacuum deposition device features a housing with a vacuum chamber where the substrate to be coated is positioned across from the source of the coating material. At least one laser beam is directed through the particles, and a detector measures the absorption wavelength shift. Additionally, two laser beams may be utilized, one transverse and one parallel to the current direction.
Career Highlights
Throughout his career, Hans Pulker has worked with companies such as Balzers Patent und Beteiligungs AG and Balzers Patent-und Beteiligungs-Aktiengesellschaft. His experience in these organizations has contributed to his expertise in vacuum technology and particle flow measurement.
Collaborations
Hans Pulker has collaborated with notable individuals in his field, including Marcel A. Lardon. Their joint efforts have further advanced the understanding and application of vacuum deposition technologies.
Conclusion
Hans Pulker's innovative patents and career achievements highlight his significant contributions to the field of vacuum deposition technology. His work continues to influence advancements in particle flow measurement and control.