Burghausen, Germany

Hans P Bortner


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1990

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Hans P. Bortner

Introduction

Hans P. Bortner is a notable inventor based in Burghausen, Germany. He has made significant contributions to the field of electronics and materials science. His innovative work focuses on processes that enhance the purity of substances used in semiconductor manufacturing.

Latest Patents

Hans P. Bortner holds a patent for a process aimed at removing n-type impurities from liquid or gaseous substances. This process is particularly relevant for substances such as hydrogen or trichlorosilane, which are used in the gas-phase deposition of silicon. The method involves adduct formation with silicon, titanium, or tin halides to effectively eliminate impurities. The impurities can be liberated from the adducts through thermal treatment, allowing for their removal. This cyclical process is notable for its low chemical requirements and ecological harmlessness.

Career Highlights

Bortner is associated with Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, where he applies his expertise in materials science. His work has contributed to advancements in the semiconductor industry, particularly in improving the quality of materials used in electronic components.

Collaborations

Throughout his career, Hans P. Bortner has collaborated with esteemed colleagues such as Helene Prigge and Robert Rurlander. These collaborations have fostered innovation and have been instrumental in the development of new technologies in their field.

Conclusion

Hans P. Bortner's contributions to the field of electronics and materials science are significant. His innovative patent for removing impurities showcases his commitment to ecological practices and efficiency in semiconductor manufacturing. His work continues to influence the industry positively.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…