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Tangstedt, Germany

Hans O Dammann

USPTO Granted Patents = 16

Average Co-Inventor Count = 2.3

ph-index = 10

Forward Citations = 286(Granted Patents)


Company Filing History:

goldMedal16 out of 14,087 
 
U.S. Philips Corporation
 patents

Years Active: 1976-1993

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16 patents (USPTO):Explore Patents
1. 5240550 - Method of forming at least one groove in a substrate layer (1993-08-31),
2. 5058971 - Planar optical isolator (1991-10-22),
3. 5029243 - Device for working a workpiece using laser light (1991-07-02),
4. 4859014 - Non-reciprocal optical waveguide device, particularly for use as an (1989-08-22),
5. 4859013 - Magneto-optical waveguide device with artificial optical anisotropy (1989-08-22),
6. 4798434 - Optical polarization regulator having a wave-guide structure (1989-01-17),
7. 4776669 - Optical path sensor including a filter (1988-10-11),
8. 4748614 - Optical wavelength-multiplexing and/or demultiplexing device (1988-05-31),
9. 4746182 - Phase-matched magnetooptical mode converter (1988-05-24),
10. 4712855 - Planar optical waveguide and method of manufacturing same (1987-12-15),
11. 4679901 - Compound optical phase grating and optical switch (1987-07-14),
12. 4626069 - Optical power divider (1986-12-02),
13. 4362359 - Coupling device for coupling signals into and out of a transmission (1982-12-07),
14. 4277138 - Diffraction grating and system for the formation of color components (1981-07-07),
15. 4159164 - Method of eliminating errors in images derived from patterns which (1979-06-26),

Title: The Innovative Contributions of Hans O. Dammann

Introduction

Hans O. Dammann is a notable inventor based in Tangstedt, Germany. With an impressive portfolio of 16 patents, Dammann has made significant strides in the fields of substrate layer technology and optical isolators. His inventions showcase a blend of ingenuity and technical expertise that continues to influence contemporary practices.

Latest Patents

Among Dammann's latest patents is a novel method for forming grooves in a substrate layer through ion etching. This innovative method involves a substrate layer comprised of a top layer with a specific etch rate (S1) and a bottom layer characterized by a different etch rate (S2). This process allows the initial formation of grooves with a depth that varies from the desired specifications, followed by an unmasked etching process to achieve the exact depth required. Another significant invention by Dammann is a planar optical isolator. This device incorporates a magneto-optical gyrotropic layer alongside an anisotropic birefringent layer, designed to ensure effective non-reciprocal rotation of light polarization while maintaining low damping for the TE-mode in the forward direction.

Career Highlights

Dammann's career is characterized by his association with the U.S. Philips Corporation, where he has contributed to cutting-edge research and product development. His focused innovations have greatly enhanced the technological capabilities within the realms of optical devices and substrate processing.

Collaborations

Throughout his career, Dammann has collaborated with notable colleagues, including Gert Rabe and Ulrich R. Killat. The synergy among these innovators has fostered an environment of creativity and advancement, leading to the successful completion of numerous projects and patents.

Conclusion

With 16 patents to his name, Hans O. Dammann exemplifies the spirit of innovation within the technological landscape. His work in substrate layer etching and optical isolators reflects a deep understanding of physical principles and engineering applications. As he continues to push the boundaries of invention, Dammann's contributions remain vital to the evolution of modern technology.

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