This inventor holds 2 USPTO granted patents. Top assignee: Tel America, Inc.. Active years: 1996-1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1996-1998
Title: Innovations of Hans Meiling in Plasma Technology
Introduction
Hans Meiling is an accomplished inventor based in Beverly, MA (US). He has made significant contributions to the field of plasma technology, holding a total of 2 patents. His work focuses on improving systems that expose samples to reactive plasmas, which are essential in various industrial applications.
Latest Patents
One of Hans Meiling's latest patents is titled "Apparatus and method for igniting plasma in a process module." This invention provides apparatus and methods for enhancing systems that expose samples to reactive plasmas, specifically for igniting plasma within a process module. The systems involve an electrode pair and a radiofrequency generator connected to one electrode. Gas is injected between the electrodes, where it is ionized and transformed into plasma. The invention includes ignition means for ionizing gas, such as silane, between electrodes separated by a small gap of less than approximately one centimeter. Additionally, a radiofrequency energy generator operates at high frequencies, such as 60 MHz, to transform molecules into plasma. Several embodiments of ignition means are presented, including an electron source, an ultraviolet source, a second radiofrequency energy generator, and radioactive sources. A process module constructed according to this invention, utilizing high-frequency energy and small electrode separations, achieves a high rate of deposition and a high production yield.
Career Highlights
Hans Meiling is currently associated with Tel America, Inc., where he continues to innovate in the field of plasma technology. His work has been instrumental in advancing the capabilities of plasma systems, making them more efficient and effective for various applications.
Collaborations
Hans has collaborated with notable coworkers, including Han Westendorp and John W Vanderpot. Their combined expertise has contributed to the successful development of innovative technologies in their field.
Conclusion
Hans Meiling's contributions to plasma technology through his patents and collaborations highlight his role as a significant inventor in this domain. His work continues to influence advancements in reactive plasma systems, showcasing the importance of innovation in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile