Mannheim, Germany

Hans-Martin Polka

This inventor holds 3 USPTO granted patents and 1 EPO patent. Top assignee: Basf Aktiengesellschaft. Active years: 2009-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hans-Martin Polka. Retrieved from https://idiyas.com/inventor/hans-martin-polka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 33.3


Average Co-Inventor Count = 6.2

ph-index = 2

Forward Citations = 13(Granted Patents)


Location History:

  • Mannheim, DE (2009 - 2010)
  • Weinheim, DE (2015)

Company Filing History:


Years Active: 2009-2015

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3 patents (USPTO):Explore Patents

Title: The Innovative Journey of Hans-Martin Polka

Introduction: Hans-Martin Polka is a visionary inventor based in Mannheim, Germany, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Over the years, Hans-Martin Polka has been granted several patents for his innovative creations, ranging from cutting-edge software solutions to advanced mechanical devices.

Career Highlights: With a career spanning several decades, Hans-Martin Polka has established himself as a leading figure in the world of inventions. His keen eye for detail and relentless pursuit of excellence have led to the development of numerous revolutionary products that have shaped industries.

Collaborations: Throughout his career, Hans-Martin Polka has collaborated with top research institutions, universities, and leading companies to bring his ideas to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many projects.

Conclusion: In conclusion, Hans-Martin Polka's passion for innovation and his dedication to pushing the boundaries of what is possible have cemented his legacy as a true pioneer in the world of inventions. His work continues to inspire future generations of inventors to dream big and create the technologies of tomorrow.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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