Wetter, Germany

Hans-Leo Hulsmann


Average Co-Inventor Count = 2.2

ph-index = 2

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 1980-1981

Loading Chart...
4 patents (USPTO):Explore Patents

Title: The Innovations of Hans-Leo Hulsmann

Introduction

Hans-Leo Hulsmann is a notable inventor based in Wetter, Germany. He has made significant contributions to the field of chemical engineering, particularly in the area of environmental remediation and enzyme technology. With a total of 4 patents to his name, Hulsmann's work reflects a commitment to innovation and practical solutions.

Latest Patents

Hulsmann's latest patents include a method for removing chlorinated phenol impurities. This method addresses the removal of impurities such as chlorinated dibenzo-p-dioxins, chlorinated dibenzofurans, chlorinated hydroxydiphenylethers, and chlorinated diphenylethers from contaminated substances. The process involves contacting the substance with agents like hydrazine or acetylene. Another significant patent is for the regeneration of an enzyme immobilizate. This invention describes a method for regenerating an enzyme immobilizate that utilizes an amorphous siliceous support, allowing for the desorption and re-adsorption of active enzymes.

Career Highlights

Hulsmann is associated with Dynamit Nobel Aktiengesellschaft, a company known for its innovative approaches in various chemical processes. His work has contributed to advancements in both environmental safety and industrial efficiency.

Collaborations

Throughout his career, Hulsmann has collaborated with notable colleagues, including Giselher Franzmann and the late Gustav Renckhoff. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise.

Conclusion

Hans-Leo Hulsmann's contributions to the field of chemical engineering through his patents demonstrate his innovative spirit and dedication to solving complex problems. His work continues to influence the industry and inspire future advancements.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…