Rodgau, Germany

Hans-Jurgen Strempel

This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignee: Degussa Aktiengesellschaft. Active years: 1985.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hans-Jurgen Strempel. Retrieved from https://idiyas.com/inventor/hans-jurgen-strempel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1985

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1 patent (USPTO):Explore Patents

Title: The Innovations of Hans-Jurgen Strempel

Introduction

Hans-Jurgen Strempel is a notable inventor based in Rodgau, Germany. He has made significant contributions to the field of cleaning products, particularly with his innovative scouring powder. His work exemplifies the intersection of chemistry and practical household applications.

Latest Patents

Strempel holds a patent for a unique scouring powder. This product contains as its sole mechanical cleaning component crystalline zeolite powder of Type A, which has a specific particle spectrum. This innovation highlights his focus on effective and efficient cleaning solutions.

Career Highlights

Throughout his career, Strempel has worked with prominent companies, including Degussa Aktiengesellschaft. His experience in these organizations has allowed him to develop and refine his inventions, contributing to advancements in cleaning technology.

Collaborations

Strempel has collaborated with notable colleagues such as Manfred Diehl and Roland Bergmann. These partnerships have likely enriched his work and fostered a creative environment for innovation.

Conclusion

Hans-Jurgen Strempel's contributions to the field of cleaning products through his patented scouring powder demonstrate his innovative spirit and dedication to improving everyday household items. His work continues to influence the industry and inspire future inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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