Lübbecke, Germany

Hans-Jürgen Arning

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Location History:

  • Lubbecke, DE (2000)
  • Lübbecke, DE (2013)

Company Filing History:


Years Active: 2000-2013

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Hans-Jürgen Arning

Introduction

Hans-Jürgen Arning is a notable inventor based in Lübbecke, Germany. He has made significant contributions to the field of plasma technology, particularly through his innovative patent. His work reflects a commitment to advancing technology and improving safety in the use of plasma apparatus.

Latest Patents

Hans-Jürgen Arning holds a patent for an "Apparatus for producing plasma." This apparatus includes a container equipped with at least one discharge electrode and a power supply unit that features at least one coupling electrode. The design allows for capacitive coupling to the discharge electrode, while ensuring that the power supply unit can be easily removed from the container. Importantly, the coupling electrode is positioned beneath an insulating layer, which prevents direct contact with the user after the power supply unit has been removed. This innovative design enhances user safety and operational efficiency.

Career Highlights

Throughout his career, Hans-Jürgen Arning has worked with several prominent companies, including Reinhausen Plasma GmbH and Cofresco Frischhalteprodukte GmbH & Co. KG. His experience in these organizations has allowed him to refine his skills and contribute to various projects in the field of plasma technology.

Collaborations

Hans-Jürgen has collaborated with notable colleagues such as Michael Bisges and Thorsten Krüger. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Hans-Jürgen Arning's contributions to plasma technology through his patent and professional collaborations highlight his role as an influential inventor. His work not only advances technological capabilities but also prioritizes user safety in the application of plasma apparatus.

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