Berlin, Germany

Hans Hermann Oppermann

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.v.. Active years: 1998-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hans Hermann Oppermann. Retrieved from https://idiyas.com/inventor/hans-hermann-oppermann-iprolxy8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1998-1999

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2 patents (USPTO):Explore Patents

Title: The Innovations of Hans Hermann Oppermann

Introduction

Hans Hermann Oppermann is a notable inventor based in Berlin, Germany. He has made significant contributions to the field of electronics, particularly in the methods of joining electronic components to substrates. With a total of 2 patents, his work has had a meaningful impact on the industry.

Latest Patents

Oppermann's latest patents include a "Method of joining electronic components to a substrate" and a "Process for remelting a contact surface metallization." These innovations showcase his expertise in enhancing electronic component integration and reliability.

Career Highlights

He is currently associated with the Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V., a leading research organization in Germany. His role at this esteemed institution allows him to collaborate with other experts in the field and contribute to cutting-edge research.

Collaborations

Some of his notable coworkers include Elke Zakel and Achim Kloeser, who work alongside him in advancing research and development in electronics.

Conclusion

Hans Hermann Oppermann's contributions to the field of electronics through his patents and collaborations highlight his importance as an inventor. His work continues to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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