Hans Goslowsky

Title: Innovations of Hans Goslowsky in Laser Processing Technology

Introduction

Hans Goslowsky is a notable inventor based in Grafting, Germany. He has made significant contributions to the field of laser processing, particularly in the development of methods for thin-film structures. His innovative approach has led to advancements that enhance material processing techniques.

Latest Patents

Hans Goslowsky holds a patent for a laser processing method specifically designed for thin-film structures. This method involves eroding material in a thin-film arrangement over a transparent layer. The process includes irradiating the thin-film with a laser pulse that has a wavelength within the absorption region of the thin-film. The result is the effective removal of the irradiated thin-film region, along with any layers above it, from the transparent layer without leaving any residue. This patent showcases his expertise in utilizing laser technology for precise material manipulation.

Career Highlights

Goslowsky is associated with Siemens Aktiengesellschaft, a leading global technology company. His work at Siemens has allowed him to apply his innovative ideas in a practical setting, contributing to the company's advancements in technology and engineering. His dedication to research and development has positioned him as a key figure in his field.

Collaborations

Throughout his career, Hans has collaborated with esteemed colleagues such as Stefan Praschek and Wolfgang Riedl. These partnerships have fostered an environment of innovation and have led to the successful development of new technologies in laser processing.

Conclusion

Hans Goslowsky's contributions to laser processing technology exemplify the impact of innovative thinking in engineering. His patent for a laser processing method for thin-film structures highlights his commitment to advancing material processing techniques. His work continues to influence the field and inspire future innovations.