Osnabruck, Germany

Hans-Georg Wollmer

This inventor holds 1 USPTO granted patent. Top assignee: Felix Schoeller Gmbh & Co. Kg. Active years: 1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hans-Georg Wollmer. Retrieved from https://idiyas.com/inventor/hans-georg-wollmer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 1987

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovations of Hans-Georg Wollmer

Introduction

Hans-Georg Wollmer is a notable inventor based in Osnabruck, Germany. He has made significant contributions to the field of photographic materials, particularly with his innovative approach to waterproof photographic paper support. His work has implications for both professional and consumer photography, enhancing the durability and usability of photographic products.

Latest Patents

Wollmer holds a patent for a waterproof photographic paper support. This invention features a multilayer design that includes a paper base coated with a layer of radiation-hardened varnish. A barrier layer, composed of a polymer film-forming material, is strategically positioned between the paper and the varnish layer. This barrier can be produced through various methods, including extrusion coating or the application of an aqueous solution or dispersion. His patent represents a significant advancement in the field, providing enhanced protection for photographic materials.

Career Highlights

Wollmer is associated with Felix Schoeller GmbH & Co. KG, a company known for its expertise in specialty papers and photographic materials. His role at the company has allowed him to focus on innovative solutions that meet the evolving needs of the photography industry. With a patent portfolio that includes 1 patent, he has established himself as a key figure in the development of advanced photographic products.

Collaborations

Throughout his career, Wollmer has collaborated with notable colleagues, including Wieland H. Sack and Heinz Trentmann. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies in the field of photography.

Conclusion

Hans-Georg Wollmer's contributions to the field of photographic materials, particularly through his waterproof photographic paper support, highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry, ensuring that photographic products are more durable and reliable.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…