Hans Fronius

Title: The Innovations of Hans Fronius

Introduction

Hans Fronius is a notable inventor based in Stuttgart, Germany. He has made significant contributions to the field of semiconductor technology. His innovative methods have paved the way for advancements in the preparation of semiconductor substrates.

Latest Patents

Fronius holds a patent for a method of preparing semiconductor substrates. This new method focuses on GaAs substrate preparation, which significantly reduces the formation of oval defects during MBE growth of selectively doped n-Al.sub.x Ga.sub.1-x As/GaAs heterostructures. The process involves treatment in H.sub.2 SO.sub.4 after mechano-chemical polishing in NaOCl solution, along with the generation of a protective surface oxide during soldering. This method routinely achieves a density of oval defects of less than 200 cm.sup.-2 for 2-.mu.m thick heterostructures. The efficiency of this preparation procedure is demonstrated by 2DEG mobilities exceeding 10.sup.6 cm.sup.2 /Vs at 6K, with a spacer width as narrow as 18 nm. Fronius has 1 patent to his name.

Career Highlights

Hans Fronius is associated with the Max Planck Society for the Advancement of Science. His work has been instrumental in enhancing the quality and efficiency of semiconductor materials. His innovative approaches have garnered attention in the scientific community.

Collaborations

Fronius has collaborated with esteemed colleagues such as Albrecht Fischer and Klaus Ploog. Their joint efforts have contributed to the advancement of semiconductor research and technology.

Conclusion

Hans Fronius is a prominent figure in the field of semiconductor technology, known for his innovative methods and significant contributions. His work continues to influence advancements in the preparation of semiconductor substrates.