Schwerte, Germany

Hans-Detlef Hinz

This inventor holds 1 USPTO granted patent. Top assignee: Ewald Dorken Ag. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hans-Detlef Hinz. Retrieved from https://idiyas.com/inventor/hans-detlef-hinz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: The Innovations of Hans-Detlef Hinz

Introduction

Hans-Detlef Hinz is a notable inventor based in Schwerte, Germany. He has made significant contributions to the field of coatings, particularly through his innovative processes. With a focus on applying inorganic coatings, his work has implications for various industries.

Latest Patents

Hinz holds a patent for a "Process for application of an inorganic coating to an electrically conductive substrate." This patent showcases his expertise in developing advanced coating techniques that enhance the performance and durability of materials.

Career Highlights

Hinz is currently employed at Ewald Dorken AG, a company known for its innovative solutions in the coatings industry. His role involves researching and developing new applications that push the boundaries of existing technologies. His dedication to innovation has positioned him as a key figure in his field.

Collaborations

Throughout his career, Hans-Detlef Hinz has collaborated with talented professionals, including Horst Russmann and Thomas Kruse. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Hans-Detlef Hinz's contributions to the field of coatings through his innovative processes and collaborations highlight his importance as an inventor. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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