Newark, DE, United States of America

Hans Agarwal

This inventor holds 1 USPTO granted patent. Top assignee: University of Delaware. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hans Agarwal. Retrieved from https://idiyas.com/inventor/hans-agarwal

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Innovations of Hans Agarwal

Introduction

Hans Agarwal is an accomplished inventor based in Newark, DE (US). He has made significant contributions to the field of materials science, particularly in the development of filtration technologies. His work is recognized for its potential applications in various industries.

Latest Patents

Hans Agarwal holds a patent for a "Supported mesoporous carbon ultrafiltration membrane and process for making the same." This innovative technology aims to enhance the efficiency of ultrafiltration processes, which are crucial in water purification and other applications.

Career Highlights

Agarwal is affiliated with the University of Delaware, where he continues to engage in research and development. His academic background and expertise have positioned him as a key figure in his field. He has been instrumental in advancing the understanding of mesoporous materials and their applications.

Collaborations

Throughout his career, Hans has collaborated with notable colleagues, including Michael Strano and Henry C. Foley. These partnerships have fostered a rich environment for innovation and have contributed to the success of various research projects.

Conclusion

Hans Agarwal's contributions to the field of ultrafiltration and materials science exemplify the impact of innovative thinking in addressing real-world challenges. His work continues to inspire future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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