Hangying Zhang

Title: Innovations of Hangying Zhang in Image Simulation and Defect Detection

Introduction

Hangying Zhang is a notable inventor based in Nanjing, China. He has made significant contributions to the field of image simulation and defect detection, particularly in the context of patterned wafer inspection. His innovative methods have the potential to enhance the accuracy and efficiency of defect detection processes.

Latest Patents

Hangying Zhang holds a patent for "Methods for image simulation, pseudo-random defect dataset generation, and micro and nano defects detection." This patent outlines a method for generating simulated images based on near-field simulations of computational electromagnetic fields. The process involves constructing a three-dimensional model and a simulated Kohler illumination model, which are used to perform optical simulations. The method aims to generate a large number of simulated images, facilitating the training of defect inspection models and addressing challenges in accessing reference images for patterned wafer defect detection. He has 1 patent to his name.

Career Highlights

Throughout his career, Hangying Zhang has worked at prestigious institutions, including Nanjing University of Aeronautics and Astronautics and the Suzhou Research Institute of Nanjing University of Aeronautics and Astronautics. His work has been instrumental in advancing research in the field of image simulation and defect detection.

Collaborations

Hangying Zhang has collaborated with notable colleagues such as Kai Meng and Junquan Zhou. Their combined expertise has contributed to the development of innovative solutions in their respective fields.

Conclusion

Hangying Zhang's contributions to image simulation and defect detection represent a significant advancement in technology. His innovative methods and dedication to research continue to influence the industry positively.