Shanghai, China

Hangjian Hu

This inventor holds 2 USPTO granted patents. Top assignee: Phichem Corporation. Active years: 2024.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2024

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2 patents (USPTO):Explore Patents

Title: Innovations of Hangjian Hu

Introduction

Hangjian Hu is a notable inventor based in Shanghai, China. He has made significant contributions to the field of etching solutions, with a focus on improving their stability and effectiveness. His work has led to the development of innovative solutions that enhance the etching process for titanium-series metals.

Latest Patents

Hangjian Hu holds 2 patents that showcase his expertise in etching technology. His latest patents include:

1. **Etching solution and application thereof** - This patent relates to an etching solution that includes at least one oxidant, at least one stabilizer, and deionized water. The combined action of hydrogen peroxide and stabilizer results in a solution with good stability, a longer service life, a faster etching rate, and better stability of the etching rate. This solution demonstrates a good etching effect on titanium-series metals.

2. **Etching composition and application thereof** - This patent discloses an etching composition that consists of various components, including an oxidizing agent, inorganic acid, organic acid, chelating agent, and deionized water. The formulation is designed to optimize the etching process and improve the overall effectiveness of the solution.

Career Highlights

Hangjian Hu is currently employed at Phichem Corporation, where he continues to innovate in the field of etching solutions. His work has garnered attention for its practical applications and contributions to the industry.

Collaborations

Hangjian Hu collaborates with Xiaoyi Gao, working together to advance their research and development efforts in etching technologies.

Conclusion

Hangjian Hu's contributions to the field of etching solutions highlight his innovative spirit and dedication to improving industrial processes. His patents reflect a commitment to enhancing the effectiveness and stability of etching solutions, making a significant impact in the industry.

Profile summary based on public USPTO records.
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